New Rh complexes containing bis(trifluoromethyl)pyrrolyl (3,4-(CF3)2-Pyr) and PMe3 ligands were synthesized and characterized. The complexes were tested as MOCVD
precursors for the growth of Rh thin films.[i]
[i] J.H. Rivers, PhD Thesis, The University of Texas at Austin, 2010, « Novel Organometallic Precursors for the Chemical Vapor Deposition of Metal Thin Films », http://repositories.lib.utexas.edu/bitstream/handle/2152/ETD-UT-2010-08-1940/RIVERS-DISSERTATION.pdf?sequence=1