Tricobalt nonacarbonyl carbine [Co3(CO)9≡CH] and tricobalt nonacarbonyl chlorocarbine [Co3(CO)9≡CCl] have been synthesized and characterized. It was found that these compounds possess good air and moisture stability, are easy to prepare, store, and handle, and have high volatility.
[Co3(CO)9≡CH] and [Co3(CO)9≡CCl] were applied as Co sources for the growth of bilayer films glass/Co/Pd, glass/Pd/Co, glass/Co/Pt, and glass/Pt/Co (having sharp boundary and good adhesion between the two metal layers). Thus, these cobalt carbonyl-carbine compounds were demonstrated to be excellent precursors for CVD of pure cobalt films [[i]]
[i] Sam W.-K. Choi, Richard J. Puddephatt, Chem. Mater., 1997, 9 (5), pp 1191–1195, DOI: 10.1021/cm9605779, http://pubs.acs.org/doi/abs/10.1021/cm9605779, « Cobalt−Palladium and Cobalt−Platinum Bilayer Films Formed by Chemical Vapor Deposition »