An organometallic compound, formed by reaction of lithium dipivaloylmethanate and niobium(V) ethoxide (possibly lithium-niobium pentakis(ethoxide) (2,2,6,6,-tetramethylheptane-2,6-dionate)
LiNb(OEt)5(thd) ) was applied as a single‐source precursor for the deposition of lithium niobate thin films on (0001) sapphire by MOCVD. As was determined by XRD and RBS, the deposited
film were epitaxial.[[i]]
[i] A.A.Wernberg; H.J. Gysling,; A.J. Filo, Th. N. Blanton, Appl. Phys. Lett., 1993, vol. 62 Issue:9, p.946 - 948