Manganese (II) bis [bis(trimethylsilyl)amide] Mn[N(SiMe3)2]2

Manganese (II) bis(trimethylsilyl)amide Mn[N(SiMe3)2]2 was synthesized and  characterized in 1978 by Bradley and coworkers. Mn[N(SiMe3)2]2 appeared to be the first structurally three coordinate Mn complex, having both terminal and bridging (µ) silylamide groups in the molecule[Mn{N(SiMe3)2}{μ- N(SiMe3)2}]2. The length of the Mn-N bond in this complex is  1.99 Å  [[i]]

[i]Bradley, D. C.; Hursthouse, M. B.; Abdul Malik, K. M.; Moseler, R. Transition Metal Chemistry 1978, 3, 253–254

Mn[N(SiMe3)2]2 for Mn films by CVD

Manganese (II) bis [bis(trimethylsilyl)amide] Mn[N(SiMe3)2]2  has been tested as precursor for low pressure CVD of metallic films of manganesemetal Mn. High-purity metal Mn films were obtained and can be considered as substrate-selective precursors. [[i]]

 [i] Prof. David V. Baxter, Prof. Malcolm H. Chisholm, Dr. Gennaro J. Gama, Andrew L. Hector, Dr. Ivan P. Parkin, Chemical Vapor Deposition, 1995, Vol. 1, Iss.2, pages 49–51, “ Low pressure chemical vapor deposition of metallic films of iron, manganese, cobalt, copper, germanium and tin employing bis(trimethyl)silylamido complexes, M(N(SiMe3)2)n, http://onlinelibrary.wiley.com/doi/10.1002/cvde.19950010203/abstract

Manganese (III) tris [bis(trimethylsilyl)amide] Mn[N(SiMe3)2]3

The molecular structure of the isostructural manganese (III) bis(trimethylsilyl)amide complex Mn[N(SiMe3)2]3 was determined by Power and coworkers in 1989. The molecular structure of the Mn complex is shown in Figure 5. The length of the Mn-N bond in this complex is  1.89 Å [[i]]

[i] Ellison, J. J.; Power, P. P.; Shoner, S. C. Journal of the American Chemical Society 1989, 111, 8044–8046

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