TITANIUM (IV) ALKOXYKETOIMINATES

Titanium bis(4-N-(2-methylethyloxy)imino-2-pentanoate) Ti(2meip)2

N-alkoxy-β-ketoiminato titanium complex, Titanium bis(4-N-(2-methylethyloxy)imino-2-pentanoate) Ti(2meip)2, was applied as a Ti precursor for the growth of barium strontium titanate (Ba,Sr)TiO3 (BST) films by liquid source MOCVD. Ultra-smooth surface and Ti composition relatively independent of the deposition temperature were reported for the grown BST layers.[i]

[i] Y.S. Min, Y. J. Cho, D. Kim, J.H. Lee, B. M. Kim, S. K. Lim, I. M. Lee, W. I. Lee, Chem. Vapor Dep., 2001, Vol.7, Iss.4, p.146-149, « Liquid SourceMOCVD of BaxSr1–xTiO3 (BST) Thin Films with a Nalkoxyβketoiminato Titanium Complex », https://onlinelibrary.wiley.com/doi/abs/10.1002/1521-3862(200107)7:4%3C146::AID-CVDE146%3E3.0.CO;2-X

Titanium bis(2-N-(2-hydroxy-2-methylethylimino)-4-pentanoate) Ti(ONO-2)2

Titanium bis(2-N-(2-hydroxy-1-methylethylimino)-4-pentanoate) Ti(ONO-3)2

     Titanium bis(2-N-(2-hydroxy-2-methylethylimino)-4-pentanoate) Ti(ONO-2)2, titanium bis(2-N-(2-hydroxy-1-methylethylimino)-4-pentanoate) Ti(ONO-3)2, as well as other three bis(N-alkoxy-β-ketoiminate) titanium complexes (titanium bis(2-N-(2-hydroxyethylimino)-4-pentanoate) Ti(ONO-1)2, titanium bis(2-N-(1,1-dimethyl-2-hydroxyethylimino)-4-pentanoate) Ti(ONO-4)2 and titanium bis(2,6-dimethyl-3-N-(2-hydroxy-2-methylethylimino)-5-heptanoate) Ti(ONO-5)2) were synthesized and investigated as potential Ti precursors for the growth of TiO2 and BaxSr1−xTiO3 thin films by liquid delivery MOCVD. Thermogravimetric analysis (TGA) demonstrated that Ti(ONO-2)2 and Ti(ONO-3)2 leave only negligible residue after thermal decomposition. Ti(ONO-2)2 was suggested to be chemically stable during flash evaporation at 280 °C, according to 1H nuclear magnetic resonance (NMR) spectra and mass spectroscopy.

Ti(ONO-2)2 and Ti(ONO-3)2 were applied as Ti precursors for the growth of titania TiO2 films by liquid delivery MOCVD. The growth rate of TiO2 layers with both precursors was comparable to that with Ti(mpd)(thd)2, and approximately three times higher than using Ti(OiPr)2(thd)2.

Ti(ONO-2)2 was tested for the deposition of a BaxSr1−xTiO3 layers (in combination with Ba(methd)2 and Sr(methd)2 as Ba and Sr sources). Very low C contamination content and smooth surface morphology without any impurity phase was found in the as-deposited BaxSr1−xTiO3 films. [i]

[i] S.H. Hong, S.K. Rim, I.-M. Lee, Y. S. Min, D. Kim, W. I. Lee, Thin Solid Films, 2002, Vol.409, Iss.1, p.82-87, « Decomposition behaviors of bis(N-alkoxy-p-ketoiminate) titanium complexes in the depositions of titanium oxide and barium strontium titanate films », https://doi.org/10.1016/S0040-6090(02)00108-6 , https://www.sciencedirect.com/science/article/pii/S0040609002001086

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