[Gd(mmp)2]2O is oxo-bridged complex requiring vaporization temperature above 170°C. (so has relatively lower volatilility, compared to Gd(mmp)3). Nevertheless,
it is potentially applicable as MOCVD or ALD precursor for the growth of Gd-containing layers. [i]
[i] R.J. Potter, P.R. Chalker, T. D. Manning, H.C. Aspinall, Y. F. Loo, A. C. Jones, L. M. Smith, G. W. Critchlow, M. Schumacher, Chemical Vapor Deposition, 2005, Volume 11, Issue 3, pages 159–169, March, 2005] Deposition of HfO2, Gd2O3 and PrOx by Liquid Injection ALD Techniques