Trisdimethylaminoarsenic As(NMe2)3
Appl. Phys. Lett. 76, 1701 (2000); http://dx.doi.org/10.1063/1.126141 (3 pages)
Hole activation from GaAs:Zn nanoclusters for p-type conduction in ZnSe
I. Suemune, J. Hirose, and A. Ueta
Growth of p-type ZnSe has been limited to nitrogen doping in molecular-beam epitaxy. As an alternative to nitrogen doping, GaAs cluster doping is proposed in this letter, where GaAs has small lattice mismatch of 0.28% to ZnSe and can potentially be heavily doped in p type. Hole activation to the valence band of the ZnSe layers could be observed by the reduction of the thickness of the GaAs layers in order to form nanoclusters. This was achieved with alternate supplies of triethylgallium and trisdimethylaminoarsenic, and the net acceptor concentration of ∼ 1017 cm−3 was observed.