Chromium (III) tetraethylborane Cr(BEt4)3
Chromium (III) tetraethylborane Cr(BEt4)3 has been applied as precursor for the deposition of chromium boride powder by thermal CVD at 300°C and process pressure 0.1 Torr, without carrier gas. Precursor was evaporated at 60°C, resulting in ~10 Torr vapor pressure.[896]