ALUMINUM HYDRAZIDES
Aluminum hydrazides are of great interest in current MOCVD research because they are potentially useful as single source precursors for the epitaxial growth of semi-conducting AlN films. Furthermore, they may exhibit specific molecular structure/higher volatility owing to the capability of the hydrazido group to act as a bidentate ligand.
Several methods of synthesis of hydrazides are existing, such as the alkane and hydrogen elimination, which requires the treatment of alanes with hydrazine derivatives containing at least one N-H function. Furthermore, the formation of salts by the employment of lithium hydrazides and chloroaluminum compounds or the hydroalumination of 2,3-diazabutadiene derivatives are facile synthetic methods. These hydrazides adopt a great variety of structures with four-, five-, and six-membered heterocycles or with polycyclic frameworks and cages. With the exception of sterically insufficiently shielded derivatives of unsubstituted hydrazine N2H4, their thermal stability is high enough to allow a secure handling. Only at elevated temperature thermolysis occurs, which in some cases yields AlN[357]