Titanium diethylamide bis(acetylacetonate) Ti(NEt2)(acac)2 was tested as precursor for the deposition of TiN/Ti layers by MOCVD. No thermal decomposition of
the precursor occurred up to 380°C, however the use of plasma enabled the dissociation of Ti(NEt2)(acac)2, resulting in gold-colored films. However, the deposited films mainly consisted of carbon.[i]
[i] J. Lee, J. Kim, H. Shin, Thin Solid Films, 1998, Vol. 320, Iss.1, p.15-19, « MOCVD of TiN and/or Ti from new precursors », https://doi.org/10.1016/S0040-6090(97)01059-6, https://www.sciencedirect.com/science/article/pii/S0040609097010596