3-Pentanone EtCOEt
3-pentanone EtCOEt has been applied as a precursor molecule for the growth of high quality single layer graphene on rhodium g/Rh(111) at 1060 K (787°C) by low pressure chemical vapor deposition (LPCVD). The chemical composition and structural properties of such self-assembled monolayers were studied by XPS and low energy electron diffraction (LEED). The formation of a 3 nm super cell was confirmed by STM. [[i][PS1] ]
[i] S Roth, J Osterwalder, T Greber, Surface Science 605 (2011) L17–L19
“Synthesis of epitaxial graphene on rhodium from 3-pentanone”,
http://www.physik.unizh.ch/groups/grouposterwalder/kspace/SS_Roth.pdf