NICKEL IMIDOTHIOSELENO-DIPHOSPHINATES

Nickel bis (P,P,P’,P’-tetraisopropyl imidothioselenodiphosphinate)) Ni[iPr2P(S)NP(Se)iPr2]2

Fig. Crystal structure of nickel bis (P,P,P’,P’-tetraisopropylimidothioselenodiphosphinate) {Ni[iPr2P(S)NP(Se)iPr2]2}

       Nickel bis (P,P,P’,P’-tetraisopropylimidothioselenodiphosphinate) {Ni[iPr2P(S)NP(Se)iPr2]2} synthesized and characterized; it crystal structure was determined by single crystal XRD.[i]

[i] A. Panneerselvam, M.A. Malik, M.Afzaal, P. O'Brien, M. Helliwell, J. Am. Chem. Soc., 2008, 130 (8), pp 2420–2421, « The Chemical Vapor Deposition of Nickel Phosphide or Selenide Thin Films from a Single Precursor »

Ni[iPr2P(S)NP(Se)iPr2]2 for Ni0.85Se, Ni2P CVD

{Ni[iPr2P(S)NP(Se)iPr2]2} was applied as single source precursor for the growth of nickel phosphide, nickel selenide thin films and their heterostructure (Ni0.85Se/Ni2P) by CVD. The nature of the deposited film (Ni0.85Se or Ni2P) was  controlled by changing  the deposition temperature.

Share this page