Hafnium tetrakis(tetrahydroborate) Hf(BH4)4 was used as a precursor for the deposition of hafnium diboride HfB2 thin films [730,[i],[ii],[iii], [iv], [v], [vi], [vii]] Hafnium tetrahydroborates decomposes to hafnium diboride, diborane and hydrogen: Hf(BH4)4→HfB2 + B2H6 + 5H2[733]. Mirrorbright, adhesive thin films up to 2 pm thick were grown on a various substrates including glass, steel, aluminum, copper, silicon, and graphite. Despite the films were amorphous, their resistivities were close to those of bulk polycrystalline material. .[673] Metal diborides prepared by CVD are used as coatings because of their hardness, high melting point, strength, resistance to wear and corrosion, and good electrical conductivity [[viii]]
[i] N. Kumar,W.Noh, S.R.Daly, G.S.Girolami, J. R.Abelson, Chem.Mater. 2009, 21, 5601–5606
[ii] S. Jayaraman, J.E. Gerbi, Y. Yang, D.Y. Kim, A. Chatterjee, P. Bellon, G.S. Girolami, J.P. Chevalier, J.R. Abelson, Surface & Coatings Technology, 2006, 200, 6629–6633
[iii] Y. Yang, S. Jayaraman, D.Y. Kim, G.S. Girolami, J.R. Abelson, J. Cryst. Growth 294 (2006) 389–395
[iv] Y. Yang, S. Jayaraman, B. Sperling, D.Y. Kim, G.S. Girolami, J.R. Abelson, J. Vac. Sci. Technol. A, 2007, 25(1), 200-206
[v] Y. Yang, S. Jayaraman, D.Y. Kim, G.S. Girolami, J.R. Abelson, Chem. Commun., 2009, 3214–3215
[vi] Y. Yang, S. Jayaraman, D.Y. Kim, G.S. Girolami, J.R. Abelson, J.Cryst.Growth 294 (2006) 389–395
[vii] S. Jayaraman, Y. Yang, D.Y. Kim, G.S. Girolami, J.R. Abelson, J. Vac. Sci. Technol. A, 2005, 23 (6), 1619-1625
[viii]http://www.scs.uiuc.edu/girolami/publications/2006-2007.html -publications of group Girolami