The only known binary titanium tetrahidridoborate (or tetrahydroborate) Ti(BH4)3 decomposes thermally at -50°C and is therefore unsuitable for CVD applications. [[i]]. The stability of this molecule can be increased by the addition of donor molecules. For example, 1,2-dimethoxyethane adduct Ti(BH4)3(dme) is stable at room temperature and sublimes readily. Ti(BH4)3(dme) was tested as chemical vapor deposition Ti precursor.
[i] G. S. GIROLAMI, JOHN E. GOZUM, Mat. Res. Soc. Symp. Proc. Vol. 168. , 1990, p.319-329 , « LOW TEMPERATURE MOCVD ROUTES TO THIN FILMS FROM TRANSITION METAL PRECURSORS »
Titanium (III) tris-tetrahydridoborate dimethoxyehtane adduct Ti(BH4)3(MeOCH2CH2OMe), has been used for CVD growth of thin films of titanium
diboride TiB2 at ca. 250°C. The principal byproducts are hydrogen and diborane. [[i]]
[i] G. S. Girolami, J. A. Jensen, J. E. Pollina, MRS Symp. Proc., Symp H, spring 1988 (G. S. Girolami, J. A. Jensen, J. E. Gozum, D. M. Pollina, MRS Symp.Proc., 121 (1988), 429-438?)