Titanium metal Ti was vacuum arc evaporated and allowed to react with borazine B3N3H6)
in the absence of N2, at deposition temperature 600 and 700 °C, and the bias of the substrates – 100 V for plasma activation. The 'Ti–B–N' coatings prepared in such combined vacuum arc PVD/ plasma CVD approach using Ti metal as Ti source
and borazine as plasma CVD co-reactant, demonstrated smaller oxidation resistance, but also somewhat smaller thermal stability upon annealing in pure N2.[i]
[i] P Karvankova, M.G.J Veprek-Heijman, O Zindulka, A Bergmaier, S Veprek, Surf. Coat. Tech., 2003, vol.163–164, p.149–156, « Superhard nc-TiN/a-BN and nc-TiN/a-TiBx/a-BN coatings prepared by plasma CVD and PVD: a comparative study of their properties »,