A series of new Rh complexes containing bis(trifluoromethyl)pyrazolate (3,5-(CF3)2-Pz) and PMe3 ligands were synthesized and characterized.
The suitability of these complexes as MOCVD precursors for the growth of Rh thin films was investigated.[i]
[i] J.H. Rivers, PhD Thesis, The University of Texas at Austin, 2010, « Novel Organometallic Precursors for the Chemical Vapor Deposition of Metal Thin Films », http://repositories.lib.utexas.edu/bitstream/handle/2152/ETD-UT-2010-08-1940/RIVERS-DISSERTATION.pdf?sequence=1