Dicobalt hexacarbonyl phenylacetylene adduct [Co2(CO)6(HC≡CPh)] and dicobalt hexacarbonyl tert-butylacetylene adduct [Co2(CO)6(HC≡CtBu)] have good air/moisture stability and high volatility . These precursors were applied as Co sources for the growth of bilayer films glass/Co/Pd, glass/Pd/Co, glass/Co/Pt, and glass/Pt/Co. Sharp boundary and good adhesion between the two metal layers was observed using these precursors. [[i]]
[i] Sam W.-K. Choi, Richard J. Puddephatt, Chem. Mater., 1997, 9 (5), pp 1191–1195, DOI: 10.1021/cm9605779, http://pubs.acs.org/doi/abs/10.1021/cm9605779, « Cobalt−Palladium and Cobalt−Platinum Bilayer Films Formed by Chemical Vapor Deposition »