Sodium hexafluoroacetylacetonate Na(hfac) (M=230.04) decomposes at 230°C, was reported to be soluble in water and warm methoxypropanol.
Sodium hexafluoroacetylacetonate Na(hfac) was reported to be applied
as precursor for the deposition of NaF thin films by MOCVD [i]
[i]Zh. Neorg. Khim. 41, 411, (1996). 2. Rec. Trav. Chim. 114, 242, (1995)
Sodium 2,2,6,6-tetramethylheptane-3,5-dionate Na(thd) (M = 206.26) is moisture sensitive compound, 100% sublimable in vacuum. Na(thd) has been characterized by TGA, DTA, DSC, mass-spectrometry.
Na(thd) is a promising CVD precursor of Na. However, its nature is complex: its mass spectrum showed several different species: one thd ligand is always bonded to one or several alkali metal ions; the strongest peaks in the mass-spectra were those due to M[3]thd[2] and M[2]thd.[i]
[i] M. Tiitta, M. Leskäla, E. Nykänen, P. Soinen, L. Niinstö, Thermochim. acta, 1995, 256 (1), 47-53
Sodium 2,2,6,6-tetramethylheptane-3,5-dionate phenantroline adduct Na(thd)(phen) and sodium 2,2,6,6-tetramethylheptane-3,5-dionate 2,2’-bipiridyne adduct Na(thd)(bipy) were synthesized and characterized by several methods, including investigation of thermal behavior of the complexes by TGA in vacuum, and mass spectrometry from Knudsen cell. Both complexes Na(thd)(phen) and Na(thd)(bipy), demonstrated sufficient volatility in vacuum and were proposed as potential MOCVD precursors for the growth of (K, Na)NbO3 films by MOCVD.[i]
[i] D. Tsymbarenko, I. Korsakov, A. Mankevich, G. Girichev, E. Pelevina, A. Kaul, ECS Trans., 2009, vol.25, Iss.8, 633-638, « New Complexes of Alkali-Metals as Precursors for MOCVD of Ferroelectric (K, Na)NbO3 Thin Films, doi: 10.1149/1.3207650, http://ecst.ecsdl.org/content/25/8/633.short,
Sodium heptafluorooctanedionate Na(fod) (M=) was reported to be applied as precursor for the MOCVD growth of NaF thin films [65]