Encyclopedia of (MO)CVD and ALD precursors
Anhydrous cobalt (III) nitrate Co(NO3)3 has been used for the CVD of polycrystalline Co3O4 films on Si(100) at 400-500°C. [[i]]
[i] D. G. Colombo, D. C. Gilmer, V. G. Young, S. A. Campbell, W. I. Gladfelter, Chem. Vap. Dep., 1998, 4, 220.
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