TUNGSTEN MOCVD-ALD PRECURSORS
The review of the precursors for the (MO)CVD of tungsten oxide WO3 was done by N. Ou et al. Precursor classes including inorganic, metal–organic and organometallic complexes were considered as MOCVD source for the growth of WO3; precursor choice was shown to greatly influence the properties of deposited material [i]
[i] N.C. Ou, X. Su, D.C. Bock, L. McElwee-White, Coord. Chem. Rev., 2020, Vol. 421, 213459,
« Precursors for chemical vapor deposition of tungsten oxide and molybdenum oxide »
https://doi.org/10.1016/j.ccr.2020.213459, https://www.sciencedirect.com/science/article/abs/pii/S0010854520301168?dgcid=rss_sd_all