Cobalt is as important component of thin layers used in microelectronics like magnetoresistive devices, integrated circuits (f.e. as a CoSi₂. interconnect), as well as  lithium battery technologies and spintronics. Highly conformal metallic Co films are used in the DRAM technology and for preventing Cu diffusion into the overlying layers, important  for the development of high density information storage devices (like USB flash memory) and solid state drives. Cobalt oxides (CoO and Co3O4) layers have been grown by CVD and ALD using various oxygen sources that include H2O and O3.