Magnesium MOCVD precursors
Magnesium
Magnesium is an important component of various thin film materials grown by CVD. Thus, magnesium is the best p-dopant for MOCVD GaN known so far, enabling this material to be applied for the preapration of blue and green LEDs and laser diodes.
Mg organometallic CVD precursors include magnesocene (the most widely used p-dopant for 13–15 nitride semiconductors) and its alkyl derivatives: Mg(C5H5)2, Mg(C5H4Me)2, Mg(C5H4Et)2, as well as octamethyl magnesum-dialuminum MgAl2(CH3)8. [4]
Thin films of MgO, which can be applied as a buffer for the growth of perovskite superconductor and ferroelectric materials, have been grown by MOCVD using various precursors such as MgCp2 (in the presence of O2), [MgMe(OtBu)]4, Mg(dmto)2, Mg(tmhd)2(tmeda), [Mg(tmhd)2]2, and Mg(acac)2.